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UID:905-801@nano.swiss
CLASS: PUBLIC
SUMMARY:European CMP & WET
DESCRIPTION:Chemical Mechanical Polishing (CMP) and WET Processing are esse
 ntial techniques in the manufacturing of semiconductor devices and micro-el
 ectro-mechanical systems (MEMS). Modern integrated circuits (ICs) and MEMS 
 undergo numerous CMP steps and WET treatments during their fabrication. Des
 pite appearing straightforward, these technologies are quite intricate, req
 uiring a solid physical and technical knowledge, along with an experimental
  mindset for process development.\n\nThe European CMP and WET User Group se
 rves as an open platform for professionals engaged with these technologies 
 in their daily work. Whether you are a process expert in device manufacturi
 ng, involved in tools and consumables, or part of the academic community, t
 his group is your technical home. It offers a unique opportunity to expand 
 your knowledge and build your network.\n\nThe group's main event is the Eur
 opean CMP and WET User Meeting, held twice a year in various European locat
 ions related to semiconductor and MEMS industries. Thanks to the generous s
 upport of numerous sponsors and exhibitors, the meeting requires only a sma
 ll admission fee.\n\nThe European CMP and WET User Group is embedded in the
  German Electrical Engineering Association (VDE) and supported by several F
 raunhofer Institutes as well as IMEC and CEA-LETI. Administrative supporter
 s are zwickerconsult, Advaplan, and ErzM-Technologies.
DTSTAMP:20260820T110441Z
DTSTART:20261029T070000Z
DTEND:20261030T170000Z
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